| 摘要 |
A method for determining the presence, during deposition of a first thin film layer, of a substance which escapes when the layer is cooled and transferred from its deposition environment for analysis to determine the presence of the substance. The layer is first covered with a second layer of a material which captures the escaping substance. This second layer is then covered with a cap layer of a substance which seals the second layer against contamination, as from the atmosphere during transfer. The layered structure, with the escaped substance retained in the second layer, is then analyzed, as by sputter depth profiling and Auger electron spectroscopy, to determine the presence in the second layer of the escaped substance and thus determine the presence of this substance during deposition of the first layer.
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