| 摘要 |
<p>A coating of phosphosilicate glass is deposited on a substrate by a chemical vapor deposition method, using a reaction gas consisting of monosilane, phosphine, and oxygen, in admixture with ammonia gas, thereby to minimise the undesirable formation and adhesion to the substrate surface of particulate by-products such as Si02, P205, and H2Si03. At the same time step coverage can be improved.</p> |
