| 摘要 |
PURPOSE:To facilitate a reticle test, by providing a first testing pattern in the initial phase of a repeated exposure process in the marginal space of a reticle and a second testing pattern in the final phase of the repeated exposure process over or adjacent to the first pattern and evaluating the positional relation of the first and second testing patterns. CONSTITUTION:A predetermined circuit pattern 2 is formed in the central portion of a recitle 1. Additionally, cross-shaped and I-shaped fiducial marks 3 are formed in the marginal space so that they serve as registering marks when the reticle is set in an exposure unit. In order to write the predetermined circuit pattern 2, the cross-shaped fiducial mark 3 is first exposed as a first testing pattern 4. Then, the predetermined circuit pattern 2 is written according to CAD data. Finally, the l-shaped fiducial mark is exposed and a second testing pattern 5 is exposed and formed over the approximately central portion of the first testing pattern 4. By using these first and second testing patterns 4 and 5, confirmation with an X-Y stage can be performed easily and the reticled can be observed and evaluated easily by a microscopic test. |
