| 摘要 |
PURPOSE:To keep the temperature of a wafer uniform and obtain highly reliable test results by a mrthod wherein a stage and a wafer are surround by a shutter and hot air is ventilated. CONSTITUTION:When a stage 1 sucks a wafer by its hot chuck 4 and arrives at a predetermined position where a wafer test is to be carried out, a shutter 5 descends and surrounds the hot chuck 4 and the wafer placed on it. Then, the wafer is heated from the rear surface by the hot chuck 4 and, at the same time, hot air is ventilated into the enclosure of the shutter 5 form a hot air blow inlet 6. When the temperature reaches the predetermined temperature and becomes stable, the wafer test is carried out. As the shutter prevents heat from being scattered and helps to heat the wafer to the proper temperature quickly and hot air with a certain temperature is ventilated into the enclosure surrounding the wafer by a hot air blower, the surface temperature of the wafer can be kept uniform and constant.
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