发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE:To utilize a semiconductor wafer remarkably effectively, by using the same conventional manufacturing method, and forming semiconductor devices on both surfaces of the semiconductor wafer. CONSTITUTION:Semiconductor devices 12 are formed by using the same conventional method on both parallel surfaces of a semiconductor wafer 11. The wafer 11 is cut and divided into an upper part and a lower part in parallel with the surfaces of the wafer in the direction of a line B-B. Then the two conventional semiconductor devices are formed. Thus the wafer 11 can be utilized effectively.</p>
申请公布号 JPS62293638(A) 申请公布日期 1987.12.21
申请号 JP19860137379 申请日期 1986.06.12
申请人 NEC CORP 发明人 YAMAZAKI JUNJI
分类号 H01L21/301;B28D5/00;H01L21/304;H01L21/78 主分类号 H01L21/301
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