| 摘要 |
PURPOSE:To obtain a uniform development processed result even if the quantity of the developing solution per unit area supplied to a PS plate is small, by supplying the developing solution to the surface of a photosensitive lithographic plate from a developing solution supplying port provided in a developing solution guide plate and leveling the developing solution by means of the guide plate. CONSTITUTION:A carrying roller pair 2 nips and carries a PS plate (PL). A developing solution supplying port 4 is provided on the surface of a developing solution guide plate 3 facing a carrying path in the width direction (horizontal direction perpendicular to the carrying direction). A developing solution is sent from a developing solution tank 8 and diluting solution tank 9 to the developing solution supplying port 4 by means of constant-quantity pumps 10 and 11. As a practical using example, fine recessed and projected parts (for example, meshed grooves at pitches of 1-10mm) are provided on the guide surface of the developing solution guide plate 3. When such uneven guide surface is used, the closely adhered part of the PS plate is developed by the developing solution kept in the recessed parts when the PS plate is carried under a condition where the part is closely adhered to the guide plate because of its curvature. Thus uniformity in development can be maintained. |
