| 摘要 |
PURPOSE:To project a beam of alignment light in an exposure light flux from outside or take it out therefrom and to facilitate alignment by a construction wherein a spectroscopic means of transmitting a beam of exposure light and reflecting the beam of alignment light which is a beam of non-printing light is disposed between a negative plate and a photosensitive substrate. CONSTITUTION:A pattern of a reticle 1 is projected onto the surface of a wafer 2 by a projection lens 3, a prism block 6, etc. of an exposure apparatus and exposed. A beam of exposure light is separated as spectral beams onto an alignment detection system of first and second microscopes 10, 11 and an auxiliary optical system 12 by means of a dichroic film 7 of said block 6. The telecontricity disturbed at the lens 3 is restored to a normal state by a telecentric compensation lens 35 of said auxiliary optical system 12. Moreover, chromatic astigmatism and com a conection optical systems 41, 50, an imaging lens 42, etc. are disposed. An alignment light is projected into an exposure light flux from outside or taken out therefrom, and thereby the alignment of the aligner is facilitated. |
