发明名称 Plasma confinement system.
摘要 <p>Disclosed is a plasma confinement system comprising a toroidal vacuum chamber (1), a toroidal coil (2) which generates a magnetic field in a toroidal direction within the vacuum chamber (1), current transformer coils (3) wound in the toroidal direction, equilibrium magnetic field coils (41...44) wound in the toroidal direction in order to control a plasma, alternating current coils (51...58) which are wound mainly in the toroidal direction and through which alternating currents for rotating the plasma in a poloidal direction are caused to flow, and power sources (61...64) which cause currents to flow through the various coils.</p>
申请公布号 EP0248382(A2) 申请公布日期 1987.12.09
申请号 EP19870107901 申请日期 1987.06.01
申请人 HITACHI, LTD. 发明人 OKADA, OSAMI
分类号 G21B1/11;G21B1/00;H05H1/12;(IPC1-7):H05H1/12 主分类号 G21B1/11
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