| 摘要 |
PURPOSE:To clean s wafer fully, thereby causing washings to thoroughly flow into such complicate and deep grooves as are possessed by fluted capacitor cells, by cleaning the wafer with the continuation of ultrasonic oscillations and swinging motions and also causing the washings to be circulated and filtrated forcibly even under the cleaning. CONSTITUTION:A wafer 34 is held by a vibratory arm 38 and is immersed in a washing tank 12 filled with the washings 14. Then, with the swing of the arm 38, the wafer 34 is cleaned by causing the washings 14 to make ultrasonic oscillations. In addition, this approach permits the washings 14 to be overflown from the washing tank 12 during the cleaning and the overflown washings are filtrated by a filter 46 and are circulated in the washing tank 12. With this approach used, a cleaning device 1 is composed of the following functional components; cleaning part 10 to be filled with the washings 14, ultrasonic oscillation generating part 20 which permits the washings 14 to make ultrasonic oscillations, carrier part 36 which holds the wafer 34 to be immersed in the washings 14, carrier holding arm part 38 to keep the carrier part 36, swinging part 30 that causes the carrier holding arm part 38 to make swinging motions, and washing circulating filtrating part 40 which allows the washings 14 to be overflown, to be filtered, and to be fed back to the cleaning part.
|
