| 摘要 |
PURPOSE:To obtain the titled agent which has excellent sensitivity and residual film ratio in an radiation of an ionizing radiation under a high vacuum by incorporating the photosensitive agent of 4-position or 5-position substd. cumyl or cumyl phenyl substd. sulfonic acid ester composed of 1-oxo-2-diazo- naphthoquinone-4-allylsulfonate to the titled agent. CONSTITUTION:The diazo-orthonaphthoquinone which is used for the positive resist as the photosensitive agent does not change to 3-indene carboxylic acid ester derivative by the radiation of the ionizing radiation under the high vacuum, and reacts with an alkaline soluble matrix resin resulted in forming a carboxylic acid ester. Thus, the difference of solubility against an aqueous alkaline solution in a developing process, depends on the difference of the solubility of the carboxylic acid ester which is formed by an unchanged photosensitive agent in the matrix resin. Especially, the photosensitive agent of 4-position (or 5-position) substd. cumyl or cumyl phenyl substd. sulfonic acid ester composed of 1-oxo-2-diazo-naphthoquinone-4-allysulfonate has excellent sensitivity and residual film ratio, after developing. |
