| 摘要 |
PURPOSE:To obtain the new photosensitive composition having processing chemicals resistance against the processing chemicals used after developing, by incorporating a compd. capable of producing an acid by radiating an active ray, and a compd. having a specific structure unit capable of decomposing by the acid to the photosensitive composition. CONSTITUTION:The titled composition contains the compd. capable of producing the acid by radiating the active ray, and the compd. which has at least one of the structural units shown by the formula and is capable of decomposing by the acid. The compd. capable of decomposing by the acid is composed of concretely the compd. contg. at least one of the orthotitanate unit and for example, is synthesized by reacting at least one of the compd. having at least one of a phenolic hydroxyl group and/or at least one of an alcoholic hydroxyl group and/or at least one of a carboxyl group and TiCl4 or Ti(OR6)4, etc., in one step or more than two steps reaction. The compd. capable of producing the acid principally includes all orgnohalo compd. which is well- known as a photo-initiator capable of forming a free radical and capable of forming hydrohalogenic acids may be used as said compd. capable of producing the acid. |
