| 摘要 |
PURPOSE:To manufacture a large amount of minute patterns of the encoder slits, to shorten the processes, and to improve the quality, by providing a film on a transparent plastic plate by hydrosis of a metal compound, and performing patterning by selective nonelectrolytic plating by utilizing ultraviolet ray exposure. CONSTITUTION:On an acryl plate, four parts of C2H3O-CH2OCH2CH2CH2Si (OCH3)3, six parts of TMS, ten parts of isopropyl alcohol, 2pts.wt. of 0.05NHCl and SnCl2 (catalyst) are mixed and churned. Thereafter it is refluxed and cured to some extent. Then it is applied by a dipping method and the like. It is dried and cured for 3hr at about 70 deg.C. Then it is immersed in 10N-NaOH and washed by water, immersed in SnCl2, and dried after several minutes. By using a photomask, ultraviolet rays are irradiated, and the mixture is immersed in PdCl2 solution. Thereafter it is washed by water, and immersed in nickel bath for several minutes, and plating is performed. In this way, the minute patterns of the encoder slits are manufactured in a large amount, the processes are shortened, and the quality can be improved. |
