发明名称 |
RADIATION-SENSITIVE POLYIMIDE PRECURSOR COMPOSITION DERIVED FROM A DIARYL FLUORO COMPOUND |
摘要 |
A radiation-sensitive polyimide precursor composition comprises a polymer of the formula <CHEM> wherein n is a positive integer corresponding to the number of units in the polymer and is sufficiently large to provide the polymer with a number average molecular weight of about 1500-15,000 as determined by vapor pressure osmometry, and wherein for any particular unit in the polymer: -> denotes isomerism; R<1> is a divalent aromatic, aliphatic or cycloaliphatic radical containing at least 2 carbon atoms. R<2> and R<3> are selected from the group consisting of a hydrogen radical and any organic radical containing a photopolymerizable olefinic double bond; and R<4> and R<5> are selected from the group consisting of perfluoro and perhalofluoro aliphatic hydrocarbons having 1 to 8 carbons; |
申请公布号 |
DE3277552(D1) |
申请公布日期 |
1987.12.03 |
申请号 |
DE19823277552 |
申请日期 |
1982.12.31 |
申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
GOFF, DAVID LEE |
分类号 |
C08F290/14;C08G73/10;C08L79/08;G03F7/037;(IPC1-7):G03C1/68;G03C1/70;G03F7/10 |
主分类号 |
C08F290/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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