| 摘要 |
PURPOSE:To obtain a Cr target member giving a film having high coercive force by sputtering or giving a base film with high productivity by providing a composition consisting of prescribed amounts or below of O and N and the balance essentially Cr. CONSTITUTION:A Cr target member of this invention consists of <=1,000ppm O, <=300ppm N and the balance essentially Cr. The purity of the target member is increased by using high purity Cr powder as starting material. The pure Cr target member is sputtered at a high rate and gives a magnetic film or a Cr base film for a Cu-Ni alloy hard disk with high productivity. The coercive force of the magnetic film can be increased upto >=600Oe. |
