发明名称 METAL FILM ADHERING APPARATUS
摘要 PURPOSE:To prevent a metal film from adhering on the outer peripheral edge of a semiconductor substrate by providing a ring-shaped shielding member the covers a predetermined width from the end of the outer peripheral edge of the substrate along the circumferential direction on a supporting base. CONSTITUTION:A holding base 5 having a reaction tube 2 connected with a high vacuum source 1 and a cathode electrode characteristic regarding a high frequency power source 4 in which an adhering material 3 is mounted in the tube 2, and a supporting base 8 connected with a high frequency power source 7 for supporting a semiconductor substrate 6 are disposed, a plurality of pawls 9, 9,.. for pressing the outer peripheral edge 6a of a semiconductor substrate 6 are provided at the base 8, and a ring-shaped shielding member 10 for covering in a predetermined width from the end along the circumferential direction the outer peripheral edge 6a of the substrate 6 is supported to the pawls 9 in the base 8. When the substrate 6 is set to the base 8 oppositely to the material 3 of the base 5, the edge 6a of the substrate 6 is covered with the shielding member 10. Thus, a metal film of the material 3 is not formed on the edge 6a, the original surface 6b of the substrate is exposed to eliminate problems of raising dust at the time of handling the substrate 6.
申请公布号 JPS62259438(A) 申请公布日期 1987.11.11
申请号 JP19860102528 申请日期 1986.05.02
申请人 NEC KYUSHU LTD 发明人 IKEYAMA KAZUTAKA;OKI MASAMI
分类号 H01L21/285;C23C14/04;C23C14/14;C23C14/40 主分类号 H01L21/285
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