| 摘要 |
PURPOSE:To enable a drying process to be performed effectively without deterio rating or damaging a dried material, by heating the dried material, which is rotated at a low speed by means of a turn table, nearly at a normal temperature by using infrared heaters and then replenishing evaporation latent heat of water by its heating so that the drying process of the dried material is performed. CONSTITUTION:A carrier 13 inside a verger 10 is provided with a plural sheets of washed wafers X supported, and placed on a turn table 14 which is driven by rotation at a low speed of 30 rpm or so. And, infrared heaters 15 and 16 are installed up and down inside the verger 10. The upper one is of a suspension type inside the verger, and the lower one is of a mounting type on a base plate 12. The dried material is heated below 40 deg.C, nearly at a normal temperature, by the respective heaters 15 and 16 so that evaporation latent heat of water attached to the dried material is replenished. Thus, because water is sublimated under a vacuum atmosphere and water inside a slit is also vaporised effectively, the wafer is prevented form being deteriorated.
|
