发明名称 RESIN COMPOSITION
摘要 PURPOSE:To obtain a resin composition excellent in chemical resistance and heat resistance, by mixing a resin containing N-phenylmaleimide with a hydroxyl group-containing unsaturated monomer and styrene as components with a polyisocyanate compound. CONSTITUTION:A resin composition comprising a resin (A) comprising 8-25wt% N-phenylmaleimide, 8-20wt% hydroxyl group-containing unsaturated monomer, 20-80wt% styrene and the balance of other copolymerizable unsaturated monomers (the total being 100wt%) and a polyisocyanate compound (B) mixed at an NCO index of 0.6-1.5. The hydroxyl group-containing unsaturated monomer plays a role of a reaction site for the urethane formation reaction, and 2-hydroxyethyl methacrylate is particularly suitably used. Examples of said other copolymerizable unsaturated monomers which can be particularly desirably used include n-butyl methacrylate, isobutyl methacrylate and trifluoroethyl methacrylate.
申请公布号 JPS62232423(A) 申请公布日期 1987.10.12
申请号 JP19860072420 申请日期 1986.04.01
申请人 ATOM KAGAKU TORYO KK 发明人 KAGEISHI KAZUJI;YASUDA SUEHIKO;KISHI NAOYUKI
分类号 C08G18/62;C08F4/28;C09D175/04 主分类号 C08G18/62
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