| 摘要 |
PURPOSE:To prevent problems in environments and to improve safety in fire, by using a solvent comprising an aromatic hydrocarbon compound as a rinsing liquid. CONSTITUTION:A desired photoresist pattern is provided on a substrate, and etching is performed. After the resist pattern is removed with a releasing agent, the substrate undergoes rinsing by using a solvent comprising aromatic hydrocarbon. When the agent is a compound having an aromatic ring, there is no special restriction. In consideration of safety in fire and storing property, however, it is desirable to use a material, whose main component comprises at least one kind selected among naphthalene compounds aud alkyl benzene compounds, in which the number of carbon atoms of the alkyl group is 4 or more. From the viewpoint of the effect of the rinsing, a mixture of the naphthalene compound and the alkyl benzene compound is suitable. |
