发明名称 |
DEPOSITED FILM FORMING DEVICE |
摘要 |
PURPOSE:To form multi-layered deposited films having uniform characteristics and improved boundary face characteristics with conserved energy by providing means for releasing gases of raw materials between respective substrate installing means for plural substrates which are arranged in a deposition chamber and are to be formed with the deposited films. CONSTITUTION:The paired gas releasing means consisting of pipes 102 for releasing the gaseous raw material for forming the deposited films and pipes 103 for releasing the halogen oxidizing agent are installed in a plurality on the longitudinal central line of a deposited film forming chamber 100. The cylindrical substrates 101 to be formed with the deposited films are disposed on both sides of such gas releasing means. Since the respective gaseous raw materials are released between the rows of the substrates 101, the raw materials for forming the deposited films are effectively utilized. The deposited films are uniformly formed on many pieces of the substrates 101 when the substrates 101 are rotated.
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申请公布号 |
JPS62228480(A) |
申请公布日期 |
1987.10.07 |
申请号 |
JP19860073102 |
申请日期 |
1986.03.31 |
申请人 |
CANON INC |
发明人 |
KATO MINORU;ARAI TAKASHI;FUJIOKA YASUSHI |
分类号 |
H01L31/0248;C23C16/24;C23C16/30;C23C16/44;C23C16/455;H01L21/205;H01L31/08 |
主分类号 |
H01L31/0248 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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