发明名称 |
SEMICONDUCTOR DEVICE FOR ELECTRON BEAM GENERATION |
摘要 |
<p>By providing in a reverse biased junction cathode an intrinsic semiconductor region (5) between the n-type surface region (3) and the p-type zone (4), a maximum field is present over the intrinsic region (5) in the operating condition. The efficiency of the cathode is increased because avalanche multiplication can now occur over a greater distance, whilst in addition electrons to be emitted at a sufficient energy are generated by means of tunnelling.</p> |
申请公布号 |
JPS62226530(A) |
申请公布日期 |
1987.10.05 |
申请号 |
JP19870059088 |
申请日期 |
1987.03.16 |
申请人 |
PHILIPS GLOEILAMPENFAB:NV |
发明人 |
HERARUDOSU HEORUGINUSU PETORUSU FUAN HORUKOMU;AASAA MARII EOHENE HOEBEREHITSU |
分类号 |
H01J1/30;H01J1/308;H01J29/04;H01J31/12;H01J31/38;H01J37/073;H01L21/027 |
主分类号 |
H01J1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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