发明名称 SEMICONDUCTOR DEVICE FOR ELECTRON BEAM GENERATION
摘要 <p>By providing in a reverse biased junction cathode an intrinsic semiconductor region (5) between the n-type surface region (3) and the p-type zone (4), a maximum field is present over the intrinsic region (5) in the operating condition. The efficiency of the cathode is increased because avalanche multiplication can now occur over a greater distance, whilst in addition electrons to be emitted at a sufficient energy are generated by means of tunnelling.</p>
申请公布号 JPS62226530(A) 申请公布日期 1987.10.05
申请号 JP19870059088 申请日期 1987.03.16
申请人 PHILIPS GLOEILAMPENFAB:NV 发明人 HERARUDOSU HEORUGINUSU PETORUSU FUAN HORUKOMU;AASAA MARII EOHENE HOEBEREHITSU
分类号 H01J1/30;H01J1/308;H01J29/04;H01J31/12;H01J31/38;H01J37/073;H01L21/027 主分类号 H01J1/30
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