| 摘要 |
PURPOSE:To reduce the grain size of the columnar crystal grains to form a magnetic material film and to adjust the saturation flux density and specific magnetic permeability of the film to prescribed values of above so as to decrease internal strains by using an ally contg. a metal consisting of one kind of element among Fe, Co and Ni or alloy essentially consisting of said one kind of the element to form the magnetic material film constituting the magnetic poles of a magnetic head. CONSTITUTION:The magnetic material film is formed by sputtering one target material 4 of a rotary type target holder 3 by the accelerated ions radiated from an ion gun 1 for vapor deposition of an ion beam sputtering device and depositing the sputtered target particles on a substrate 6. The metal consisting of one kind of the element selected from Fe, Co and Ni or the alloy essentially consisting of said one kind of the element is used for the magnetic material film. The grain size of the columnar crystal grains to form the magnetic material film is reduced to provide >=15kG saturation flux density to the film, and the internal strain of the film is made slight to provide >=1,000 specific magnetic permeability to the film.
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