发明名称 RESIN FOR OPTICAL MATERIAL
摘要 PURPOSE:To provide the titled resin having excellent heat-resistance and thermal stability in addition to good moisture-resistance and surface hardness and composed of a radical polymerization product of an ethylenic unsaturated monomer, provided that a major part of the above monomer is composed of a di(meth)- acrylate produced by a specific method. CONSTITUTION:The objective resin for an optical material is composed of a radical polymerization product of an ethylenic unsaturated monomer. In the above resin, at least a major part of the monomer is an ester produced by esterifying 1mol of tricyclo-[5,2,1,0<2>,<6>]decane dimethanol with 2mol of a mixture of acrylic acid and methacrylic acid (the molar ratio of methacrylic acid/acrylic acid is preferably 0.5-2.5) usually in the presence of an esterification catalyst such as sulfuric acid, phosphoric acid, etc., and a polymerization inhibitor such as hydroquinone, phenothiazine, etc., at 80-150 deg.C.
申请公布号 JPS62225508(A) 申请公布日期 1987.10.03
申请号 JP19860070347 申请日期 1986.03.28
申请人 MITSUBISHI PETROCHEM CO LTD 发明人 TAKEYAMA TADAO;ARITOMI MITSUTOSHI
分类号 C08F220/20;C08F20/10;C08F220/10;C08F220/18;C08F220/30;G02B1/04 主分类号 C08F220/20
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