| 摘要 |
PURPOSE:To obtain a highly humidity-resistive and reliable equipment by providing an organic resin coating layer on the top of the solid-state image pickup device and by defoaming the organic resin coating layer in a passivation layer which has an inorganic thin film on the organic resin coating layer. CONSTITUTION:An organic resin coating layer 9 is formed on a substrate on which a thin film transistor and a photodetector are made by dipping or spin- coating. This is left in a vacuum for several ten minutes to several hours and is perfectly defoamed. The time of defoaming is different according to the kind of the organic resin, the thickness of the film, viscosity, etc. but it is determined by observing a greatly step-different region. If the time of defoaming is insufficient, a foam 13 remains in the great step-different region and if defoamed until such a foam 13 does not exist, no foam remains in the organic resin coating layer. An inorganic thin film 10 such as SiO2 or Si3N4 is deposited by such as sputtering on the organic resin coating layer 9 cured at 300 deg.C or lower temperature.
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