发明名称 TREATING APPARATUS
摘要 PURPOSE:To improve the number of materials to be treated and uniformity of treatment, by connecting a load locking mechanism, which loads and unloads the material to be treated in and out of a treating chamber, without opening the treating chamber to the outside, through opening parts, which are formed at parts of the chamber. CONSTITUTION:The insides of a treating chamber 1 and a conveying tube 5a are evacuated to a specified degree of vacuum. The inside of the treating chamber 1 is uniformly heated to a specified temperature by a heater 3. A sample stage 4 is stopped at the facing position of an input chamber 5b and an output chamber 5c. A gate valve V2 of the input chamber 5b is opened, and a material to be treated 2 is inputted in the input chamber 5b. The gate valve V2 is closed, and the inside of the input chamber 5b is evaporated. A gate valve 1 is opened, and the material to be treated 2 is mounted on the sample stage 4 from the input chamber 5b. The sample stage 4 is lifted, and the material to be treated 2 is positioned at the center of the inside of the treating chamber 1. A thin film comprising a specified material is uniformly formed on the surface of the material to be treated 2. Thereafter, the material to be treated is manipulated in the reverse steps and conveyed to the outside through a gate valve V3, the output chamber 5c and a gate valve V4.
申请公布号 JPS62221107(A) 申请公布日期 1987.09.29
申请号 JP19860064044 申请日期 1986.03.24
申请人 HITACHI LTD 发明人 SAKAI HIDEO;KANAI FUMIYUKI
分类号 H01L21/205;H01L21/302;H01L21/3065;H01L21/31 主分类号 H01L21/205
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