| 摘要 |
PURPOSE:To utilize a clean room effectively, by providing a second storing chamber under the floor or over the ceiling of the clean room, and suppressing dust and damage to wafers to the minimum degree. CONSTITUTION:A second storing chamber 5 is provided under a floor 3 of a clean room 1. The second storing chamber 5 is communicated to a first storing chamber 2, which is provided vertically in the clean room. Wafers are moved between the first and second storing chambers 2 and 5 by using an elevator 9, a robot 1 and the like. Since only the elevator 9, which is moved up and down, and a buffer 8 are housed in the second storing chamber 2, the floor area exclusively occupied by the storing chamber 2 becomes remarkably small, and the clean room can be used effectively. Since the first and second storing chambers 2 and 5 are approximately tightly closed chambers, dust caused by human activity is not yield with respect to the wafer.
|
