| 摘要 |
PURPOSE:To reduce defect of film causing white facula in an image by depositing amorphous silicon on a conductive substrate, after exposing glow- discharge plasma using gaseous carbon fluorides, oxygen, and hydrogen respectively in order. CONSTITUTION:The conductive substrate body composed of an Al drum, etc., is put in a vacuum reactor, and gaseous carbon fluoride (example, CF4) is supplied to the vacuum reactor, and the body is exposed in the glow discharge plasma which is generated by impressing a high frequency electric field. Further, the obtd. substrate body is exposed to an oxygen plasma introducing an oxygen gas into the reactor, followed by exposing it to a hydrogen plasma by introducing a hydrogen gas to the reactor, then a layer mainly composed of amorphous silicon is laminated on the obtd. substrate. Thus, the titled body having less defect of film causing white facula in the image is obtd. |
