发明名称 BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To form a pattern having no XY anisotropy and only a little edge roughness by using beams having distribution, in which the extension of Gaussian type distribution is cut on its midway, and increasing the inclination of the rise of a dose profile in the X direction. CONSTITUTION:Beams emitted from an electron gun 1 are focussed by a first condenser lens 2, and image-formed to a slit 8 for forming beams. Beams emitted from the slit 8 take a distribution shape that the outside is cut off from the radius of the beams on the X direction side from beams having circular- section Gaussian intensity distribution. The beams are reduced by a second condenser lens 4 and an objective 7, and image-formed onto a target 6 under the state in which they are deformed by some aberration. Consequently, the inclination of the rise of a dose profile in the X direction is increased. Accordingly, a pattern having no XY anisotropy and only a little edge roughness is shaped.
申请公布号 JPS62196824(A) 申请公布日期 1987.08.31
申请号 JP19860038234 申请日期 1986.02.25
申请人 TOSHIBA CORP 发明人 NAKASUJI YUZURU
分类号 H01J37/305;H01L21/027;H01L21/30 主分类号 H01J37/305
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