| 摘要 |
<p>Soluble chemical compounds having a high affinity for hydroxyl radicals are effective stabilizers for chelating agents used in the hydrogen sulfide removal process. The stabilizers include water-soluble aromatic compounds, bromide ions, iodide ions, cyanides, nitrites, amino acids, sugars, ascorbates, alcohols, polyols, aliphatic aldehydes, soluble organic compounds having unsaturated carbon-carbon bonds, dimethyl sulfoxide, organic disulfides, alkyl amines, and formates. The aromatic compounds have the additional benefit of combining with hydroxyl radicals to form chelating agents.</p> |
