发明名称 PHOTO-SETTING RESIN COMPOSITION
摘要 PURPOSE:The titled composition, obtained by copolymerizing a quaternary ammonium salt with a monomer having unsaturated double bond capable of addition polymerization by irradiation with light, having improved dyeability for acid dyes, preservation stability, safety, etc., and useful as a color filter forming material, etc. CONSTITUTION:A composition obtained by copolymerizing a monomer expressed by formula I (R<1> is H, CH3, etc.; X is -O- or -NH-; Y is 1-4C hydrocarbon; R<2>-R<4> are H or 1-4C alkyl; Z is anion) with a monomer expressed by formula II (R<4> is H, C2H5, etc.) normally in the presence of a radical polymerization agent, preferably by a solution polymerization method. The above-mentioned copolymerization reaction is preferably carried out at 60-120 deg.C for 1-6hr. For example, methacryloyloxypropyltrimethylammonium chloride, etc., may be used as the compound expressed by formula I and, e.g. mono(2- methacryloyloxyethyl)maleate, etc., may be used as the compound expressed by formula II.
申请公布号 JPS62190207(A) 申请公布日期 1987.08.20
申请号 JP19860032251 申请日期 1986.02.17
申请人 CHISSO CORP 发明人 SATO HIDEO;KAWABATA HIROSHI
分类号 C08F220/34;C08F20/10;C08F20/34;C08F20/52;C08F220/60;C08F222/26 主分类号 C08F220/34
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