发明名称 PRODUCTION OF RADIATION-RESISTANT POLYMER COMPOSITION
摘要 PURPOSE:To obtain a radiation-resistant polymer compsn. which has excellent radiation resistance and does not have a corrosive action, by adding an acenaphthylene/styrene oligomer to a polymer material, carrying out a free radical generating treatment and polymerizing the oligomer. CONSTITUTION:An acenaphthylene (derivative) of formula I (wherein R is a 1-4 C alkyl, an alkoxy or an alkyl ester; and m is 0, 1, 2, 3 or 4) is copolymerized with a styrene (derivative) of formula II (wherein R' has the same meaning as in R; m is 0, 1, 2, 3 or 4) to produce an acenaphthylene/styrene oligomer wherein the average degree of polymn. of acenaphthylene (derivative) is 1 to 3. The oligomer is added to a polymer material (e.g., an ethylene/ propylene copolymer), a free radical generating treatment is carried out and to oligomer is polymerized in the polymer material to obtain a radiation- resistant polymer compsn. The compsn. is suitable for use as a covering material for wires and cables which are used in a radiated atmosphere.
申请公布号 JPS62185752(A) 申请公布日期 1987.08.14
申请号 JP19860026017 申请日期 1986.02.10
申请人 FURUKAWA ELECTRIC CO LTD:THE;NIPPON STEEL CHEM CO LTD 发明人 FUJIMURA SHUNICHI;ISHITANI HAYAO;NOZAWA MASAYUKI;TOKUMITSU AKIRA
分类号 C08L101/00;C08F12/00;C08F212/32 主分类号 C08L101/00
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