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发明名称
DOPING OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPS62179721(A)
申请公布日期
1987.08.06
申请号
JP19870015025
申请日期
1987.01.22
申请人
SIEMENS AG
发明人
HARARUTO BINDAA;HERUMUUTO FUERU;WARUTAA HORUTOSHIYUMITSUTO;RONARUTO KAKOSHIYUKE
分类号
H01L21/265;H01L21/74
主分类号
H01L21/265
代理机构
代理人
主权项
地址
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