| 摘要 |
PURPOSE:To obtain a good pattern shape and accuracy by adjusting a solvent/ phenols to about 1-10 by weight in the stage of bringing the phenols and aldehydes into reaction under an acidic catalyst in the presence of a solvent which is a good solvent of the novolak resin. CONSTITUTION:The novolak resin is synthesized by adjusting the solvent/phenols to about 1-10 by weight in the stage of bringing the phenols and aldehydes into reaction under the acidic catalyst in the presence of the solvent which is the good solvent of the novolak resin. Phenol, o-cresol, etc., are used as the phenols. Alcohols, ketones, etc., are used for the solvent which is the good solvent of the novolak resin. The charging of the solvent together with the phenols from the beginning to cause the reaction is preferable as the period of adding the solvent. The novolak resin for a positive type photoresist having a good pattern shape and good sensitivity is thus obtd. |
