| 摘要 |
PURPOSE:To make a plasma treatment over the entire surface of a substrate uniform by providing means for changing the direction of the generated magnetic field with time to a magnetic field generator. CONSTITUTION:A power source 16 is so set that the Miller magnetic field 10 having prescribed intensity is formed. The plasma 14 of a high density is formed and the plasma is confined into the prescribed space by the Miller magnetic field 10 when microwaves are supplied through waveguides 11, 12 into a chamber 1. The argon ions in the plasma sputter a film forming material from a cathode 6 when electric power is impressed to the cathode 6 to apply said power to the high-density plasma 14. The electric currents flowing in electromagnetic coils 8, 9 are periodically inverted so that sputtering by plasma is uniformly executed. the film having a uniform thickness is formed on the substrate 5 by the above-mentioned mechanism.
|
