| 摘要 |
PURPOSE:To prevent a fine pattern from being collapsed due to the diffraction or interference of a light by dividing the fine pattern into first and second patterns, forming the first pattern, then forming the second pattern by a lifting off method. CONSTITUTION:An aluminum layer 12 is coated with a photoresist for forming a first pattern, prebaked, selectively exposed to obtain a photoresist pattern 13 of the first pattern through a step such as a rinsing step. An interval L1 of the pattern 13 is extended as compared with the interval of the final electrode pattern directly made of the first and second patterns, and disadvantages due to the diffraction or interference of a light is readily removed. Then, the layer 12 is selectively removed by the pattern 13, the pattern 13 of the first pattern is removed, and the patterned layer 13 remains on a piezoelectric substrate 11. Then, the entire surface is coated as a readily removing layer a photoresist 14, which is selectively exposed to expose the substrate 1 at the second pattern.
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