发明名称 A METHOD FOR PRODUCING AN ENCAPSULATED SEMICONDUCTOR USING A CURABLE EPOXY RESIN COMPOSITION
摘要 <p>A curable epoxy resin composition comprising a novolak type epoxy resin which is produced from substituted phenol novolak and epihalohydrin and whose infrared spectrum, measured in 3% W/V dichloromethane solutiton using an infrared spectrophotometer of 2 mm cell length, has an absorbance of 0.15 or less in the frequency range from 3570 to 3600 cm<-><1>. The resin is useful particularly in encapsulating and laminating applications in electronic fields.</p>
申请公布号 EP0122086(B1) 申请公布日期 1987.07.22
申请号 EP19840302133 申请日期 1984.03.29
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TAKAGISHI, HISAO;KANAGAWA, SHUICHI;KAMIO, KUNIMASA;SUMIYOSHI, KAZUO
分类号 C08G59/00;C08G59/08;C08G59/18;C08G59/32;C08J5/24;C08K5/02;C08L63/00;C08L63/04;H01B3/40;(IPC1-7):C08G59/08 主分类号 C08G59/00
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