| 摘要 |
<p>PURPOSE:To save manufacture labor man-hours, by changing movement of a photosensitive material coated on a base, exposing it, forming a group of patterns different from a mask pattern on the base, and enabling connection of conductive parts in a chip. CONSTITUTION:A mask base 6 has a light-transmitting part 7, a light-shielding pattern 8, and right and left light-transmitting parts 9, 10. A resist film on the part A of a base 12 corresponding to the part 7 is exposed using this mask reticle, the base 12 is moved by a distance slightly shorter than 1 pitch to expose the part B, and then the base 12 is moved by a distance slightly longer than 1 pitch to expose the part C, thus permitting a memory chip having conductive patterns 16, 17 connected to each other in the chip to be obtained by processing the base 12.</p> |
