发明名称 PROCEDIMIENTO PARA REVESTIR SUSTRATOS EN UNA CAMARA DE VACIO
摘要 <p>In the previously used methods for the deposition of layers on surfaces by means of chemical reactions with gases, which are introduced into the reaction room or chamber (chemical vapor deposition, CVD), electrical glow discharge and mainly high-frequency discharges were used for the activation of the reactants. According to the invention, the maintaining of a low-voltage arc discharge in the reaction room during the coating is recommended. The surprising result of this is a considerably stronger activation and ionization and a more uniform coating also on surfaces of complex shape.</p>
申请公布号 ES554902(D0) 申请公布日期 1987.07.16
申请号 ES20020005549 申请日期 1986.05.13
申请人 BALZERS AKTIENGESELLSCHAFT 发明人
分类号 C23C16/50;C23C16/27;C23C16/503;(IPC1-7):C23C14/24 主分类号 C23C16/50
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