| 摘要 |
<p>A device for gas atomizing a liquid stream, such as a stream of molten metal or metal alloy, has an atomizing device including, for example, an annular opening for receiving the stream. The atomizing device is arranged for applying atomizing gas to the stream so as to form a spray of atomized particles. At least a part of the atomizing gas, and preferably all, is applied by means movable relative to the stream whereby movement is imparted to the spray. This movement leads to improved uniformity or control of deposition.</p> |
