| 摘要 |
<p>PURPOSE:To minimize pattern dimensions and variation in thicknesses of dyeing layers, to reduce the color reproducibility, color flicker, unevenness in color, etc., and to improve the characteristics of the picture quality, by forming the dyeing layers which become color filters in the forms of blanked patterns on the entire surface of a substrate including a dividing line part. CONSTITUTION:Photodiodes 2 are formed on the surface of a semiconductor substrate 1 under buried conditions at prescribed pitches and the 1st dyeing layer 7' which is the 1st color filter is formed on a smoothing layer 6. The dyeing layer 7' has a blanked pattern, in which the parts of the layer 7' corresponding to the prescribed ones of the photodiodes are removed. A transparent intermediate layer 8 is formed on the 1st dyeing layer 7' and the 2nd dyeing layer 9' is formed on the intermediate layer 8. The second dyeing layer 9' also has a blanked pattern. In addition, transparent layers (white pattern) 11 are formed at the parts of the substrate corresponding to the photodiodes where at least one of the 1st and 2nd dyeing layers 7' and 9' is removed, so as to obtain a smoothing effect. A protective layer (overcoat layer) 10 is formed as the uppermost layer.</p> |
