发明名称 METHOD FOR MONITORING PLATING LINE
摘要 PURPOSE:To efficiently monitor a plating line and to improve the plating quality by providing a mechanism which emits an alarm only when there is a material to be plated and when plating conditions are abnormal in the plating line. CONSTITUTION:A chucking state of a lead frame 1 is detected by a sensor 2 in a detecting part 12 for frame chucking and the detection signal is held once in a holding circuit 3. The lead frame 1 is then set to a spot plating mask 4 of a plating stage 13 and is sealed by a sponge 5. Such frame is installed to a power feed pin 7. The frame is immersed in the plating cell and a current and voltage is supplied from a power source 14 to an anode 6 and the pin 7. The timing for the spot plating is taken by a synchronizing signal circuit 8 and the detection signals of an ammeter 15 and voltmeter 16 are discriminated by a current abnormality discriminating circuit 9 and voltage abnormality dis criminating circuit 10. The results thereof and the result of the holding circuit 3 are combined. The alarm is emitted by the alarm device 11 only when the lead frame 1 exists and there is abnormality in the plating conditions.
申请公布号 JPS62146298(A) 申请公布日期 1987.06.30
申请号 JP19850287504 申请日期 1985.12.20
申请人 HITACHI CABLE LTD 发明人 OGINOME NOBORU;KUROBA TOSHIAKI
分类号 C25D21/12 主分类号 C25D21/12
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