| 摘要 |
PURPOSE:To prevent the contamination of a vacuum treatment chamber and to make efficient vacuum treatment of many kinds of substrates by providing a preliminary vacuum chamber for carrying in and out of the substrates and vacuum treatment chamber to the wall surface of a vacuum conveying chamber and providing a vacuum evacuation system and substrate conveying or moving mechanism to each of the respective chambers. CONSTITUTION:This vacuum treatment device consists of the preliminary vacuum chamber 2 which carrier the substrates into said chamber from atm. and ejects the substrates subjected to the vacuum treatment to the outside, the treatment chamber 1 provided with electrodes 16, 25 and the vacuum conveying chamber 52 provided with the substrate conveying mechanism 48. The vacuum evacuation systems are provided to the respective chambers of the above-mentioned device to prevent the contamination of the treatment chamber 1 from the atm. The chambers 1 and 2 are freely attachably and detachably provided into installation holes 6, 7 on the wall surface of the chamber 52 so as to easily deal with the change of the substrate treatment mode. The movement of the substrates 18a, 18b between the treatment chamber 1 and the preliminary vacuum chamber 2 as well as the positions in the route for conveying the substrates is efficiently executed by the substrate moving mechanism consisting of lifts 21, 37.
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