发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PLATE MATERIAL
摘要 PURPOSE:To improve the inking performance of a printing ink and printing resistance and to prevent stains due to rapid development or the like by using a polymer having phenolic hydroxyl groups and alcoholic hydroxyl groups each in a specified range. CONSTITUTION:The polymer to be used has in the molecular structure, repeating units derived from a monomer having phenolic hydroxyl groups, preferably, embodied by N-(4-hydroxyphenyl)-(meth)acrylamide, preferably, in an amount of 6-15mol%, a monomer having alcoholic hydroxyl groups, preferably, embodied by 2-hydroxyethyl (meth)-acrylate, preferably, in an amount of 15-60mol%, and a monomer having cyano groups on the side chains, preferably, such as acrylonitrile or methacrylonitrile.
申请公布号 JPS62133451(A) 申请公布日期 1987.06.16
申请号 JP19850272896 申请日期 1985.12.04
申请人 KONISHIROKU PHOTO IND CO LTD;MITSUBISHI CHEM IND LTD 发明人 GOTO SEI;SUZUKI NORIHITO;MAEDA YOSHIHIRO;SHIMIZU SHIGEKI
分类号 G03C1/72;G03F7/00;G03F7/004;G03F7/021;G03F7/033 主分类号 G03C1/72
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