发明名称 SEMICONDUCTOR MANUFACTURING EQUIPMENT
摘要 PURPOSE:To execute the specified programs in a reserved execution sequence by reading the respective programs of the running of the furnace, substrate transfer and process after the correction from the first - third memories by a control device, correcting and storing them in the third memory. CONSTITUTION:A reaction furnace, respective means for heating of the furnace, gas supply and substrate transfer, and a control device of these are provided. In the control device, a group of programs for processing the reaction process time, a gas to be used and the flow rate, the furnace temperature, etc. is stored in a ROM 661 by a CPU 61, a group of programs for substrate transfer is stored in a ROM 662, and the programs after correction are stored in a magnetic tape 98. Any program is read out from these by operating a keyboard 78, corrected according to the correction input, and stored in the tape 98. The execution sequence of the stored programs is freely reserved by operating the keyboard 78, and the specified programs are executed in the specified order by depressing the start button of the board. Errorneous works are reduced because of the reserve function, and fully automated process can be effected because the reserve including substrate transfer is available.
申请公布号 JPS62130515(A) 申请公布日期 1987.06.12
申请号 JP19850270999 申请日期 1985.12.02
申请人 TOSHIBA MACH CO LTD 发明人 KOMIYAMA KICHIZO;EHATA HITOSHI;MITANI SHINICHI
分类号 H01L21/205;H01L21/22;H01L21/31;H01L21/324 主分类号 H01L21/205
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