| 摘要 |
PURPOSE:To enable a semiconductor wafer to be inspected easily over the whole surface thereof, by applying a spot luminous flux to one point on the periphery of the wafer to be inspected, and moving the wafer by a distance corresponding to the radius thereof while rotating it so as to allow the luminous flux to scan the surface of the wafer spirally from the periphery to the center. CONSTITUTION:A wafer 1 is placed on a wafer stage 2 and is rotated by means of a stage rotating mechanism 3. A spot luminous flux 6 is applied to one point on the periphery of the wafer 1 and, as it is, the stage rotating mechanism 3 is moved by means of rollers 5 along a track 4 by a distance corresponding to the radius of the wafer. Since the wafer 1 is rotated also during the movement of the stage rotating mechanism, the spot luminous flux 6 scans the surface of the wafer 1 spirally from the periphery to the center of the wafer 1. Accordingly, the whole surface of the wafer 1 can be thereby observed visually and continuously. The wafer stage may be moved by a manually, electrically (motor, solenoid) or air acutuated means.
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