DEVELOPMENT OF NEGATIVE PHOTORESIST

摘要

A process is provided for developing images in exposed negative photoresists which comprises treating a substrate coated with the photoresist with a mixture of trichloroethane and an aliphatic alcohol, preferably isopropanol or tert-butanol, which may optionally be heated to an elevated temperature. The alcohol is present in an amount up to that forming a constant boiling composition (azeotropic composition).