| 发明名称 |
Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers. |
| 摘要 |
<p>The dissolution rate in alkaline developer solutions of image-wise exposed photoresist systems based on diazoquinone sensitized polyamic acid is reduced to prepare relief images of fine line resolution by reducing the acidity of the polyamic acid prior to exposure.</p> |
| 申请公布号 |
EP0224680(A2) |
申请公布日期 |
1987.06.10 |
| 申请号 |
EP19860113861 |
申请日期 |
1986.10.07 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHION, KAOLIN;CHOW, MING-FEA;MOREAU, WAYNE;SNYDER, NANCY WARD |
| 分类号 |
G03C1/72;G03F7/004;G03F7/022;G03F7/023;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/08 |
主分类号 |
G03C1/72 |
| 代理机构 |
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代理人 |
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| 地址 |
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