发明名称 METHOD AND APPARATUS FOR PHOTOCHEMICAL REACTION PROCESSING
摘要 PURPOSE:To execute photochemical reaction processing effective for flattening of a device by self-alignment by diagonally irradiating light of parallel luminous fluxes on a substrate in a gaseous atmosphere and relatively rotating the above- mentioned light and the substrate. CONSTITUTION:The light is irradiated from a light source 1 via an optical system 2 and incident window 4 on the desired part on the surface of the substrate 5 in a reaction cell 3 in which the desired gaseous atmosphere is maintained by a gas supply system 10 and exhaust gas system 11, by which the substrate is subjected to the processing based on the photochemical reaction. The above-mentioned light in the above-mentioned photochemical reaction processing method is made into parallel luminous fluxes and such light is diagonally irradiated on the above-mentioned substrate 5 attached via a rotary stage 8 and a heater 9 to an inclined stage 7 on an X-Y stage 6 for position adjustment. The above-mentioned substrate is further rotated around the axis perpendicular thereto as the axis of revolution relatively with the above-mentioned light by the above-mentioned rotary stage 8.
申请公布号 JPS62120476(A) 申请公布日期 1987.06.01
申请号 JP19850259986 申请日期 1985.11.19
申请人 NEC CORP 发明人 KISHIDA SHUNJI
分类号 C23C16/48;C23C16/04;C23F4/00 主分类号 C23C16/48
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