ELECTROPHOTOGRAPHIC SENSITIVE BODY

摘要

PURPOSE:To improve the adhesion of a photoconductive layer to a support, the wear and shock resistances and environmental resistance by providing a two-layered structure to the photoconductive layer and forming a microcrystalline silicon layer as the lower layer and an amorphous silicon nitride or carbide layer as the upper layer. CONSTITUTION:A blocking layer 12 for inhibiting the implantation of carriers is formed on an electrically conductive support 10 of Al or the like. A photoconductive layer 13 having a two-layered structure is then formed on the blocking layer 12 to obtain a sensitive body. The lower photoconductive layer 14 on the support side is made of microcrystalline silicon (muc-Si) and the upper photoconductive layer 16 on the surface side is made of amorphous silicon nitride (a-SiN) or amorphous silicon carbide (a-SiC). The blocking layer 12 inhibits the implantation of carriers into the photoconductive layer 13. The carriers are generated in the support 10 when corona discharge is caused on the surface of the sensitive body. When the carriers are implanted into the photoconductive layer 13, a record in the layer 13 is vanished by neutralization.