| 摘要 |
PURPOSE:To enable slip of pattern position to be eliminated and a submicron pattern high in precision to be formed by coating an electron beam resist with a solution of the salt type complex of polymer polycations and tetracyanoquinodimethane. CONSTITUTION:A thin film is formed on the electron beam resist by coating it with a solution of the salt type complex of polymer cations and tetracyanoquinodimethane having a high electric conductivity of 10<-9>-10<-10>S.cm<-1> in order to prevent accumulation of electrostatic charge generated at the time of electron beam scanning. The complex is soluble in many kinds of solvents, and good in film-forming property at the time of coating the substrate to be treated by the spin coating method, and it can be formed into a uniform electrically conductive film free from any pinhole as thin as 0.05-0.4mum. As the polymer polycations, polyvinylbenzyltriethylammonium, poly-4-vinyl-N-methylpyridinium, and the like can be enumerated. |
