| 摘要 |
PURPOSE:To obtain a semiconductor processor capable of uniformly etching or processing a film deposition by providing a moving mechanism for moving so that the positional relationship between the gas supply port of a gas supplying member and a material to be processed on a stationary base maintains predetermined state. CONSTITUTION:A plurality of materials 31 to be processed are mounted on a material stationary base 23 in a vacuum vessel 21, gas in the vessel 21 is evacuated by an exhaust tube 22 to evacuate in a predetermined vacuum state, etching gas is then supplied from a gas supply tube 29 through a coupler 30 into a ga supplying unit 26. When a motor 24 is simultaneously driven, the base 23 mounted at a bearing 25 is rotated, and the unit 26 coupled through fittings 28 with the base 23 rotates synchronously with the base 23. Accordingly, the gas from a gas supply port 27 of the unit 26 is steadily blown to the materials 31 on the base 23. Therefore, the uniformity of etching can be obtained.
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